Epitaxy base, semiconductor light emitting device and manufacturing methods thereof

ABSTRACT

An epitaxy base including a substrate and a nucleating layer disposed on the substrate. The nucleating layer is an AlN layer with a single crystal structure. A diffraction pattern of the nucleating layer includes a plurality of dot patterns. Each of the dot patterns is substantially circular, and a ratio between lengths of any two diameters perpendicular to each other on each of the dot patterns ranges from approximately 0.9 to approximately 1.1. A semiconductor light emitting device, a manufacturing method of the epitaxy base, and a manufacturing method of the light emitting semiconductor device are further provided.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation application of and claims thepriority benefit of a prior application Ser. No. 14/810,487, filed onJul. 28, 2015, now allowed, which claims the priority benefit of Taiwanapplication Ser. No. 103134381, filed on Oct. 2, 2014. The entirety ofeach of the above-mentioned patent applications is hereby incorporatedby reference herein and made a part of this specification.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to an epitaxy base, a semiconductor light emittingdevice, and manufacturing methods thereof, and particularly relates toan epitaxy base, a semiconductor light emitting device, andmanufacturing methods thereof offering a preferable epitaxy quality.

2. Description of Related Art

Semiconductor light emitting devices, such as light-emitting diodes(LEDs), are manufactured by using compounds (e.g. gallium nitride,gallium phosphide, and gallium arsenide.) containing a Group III-Velement. A lifetime of the LEDs may be as long as 100,000 hours. Inaddition, the LEDs have the advantages of a quick responding speed(approximately 10⁻⁹ seconds), smaller size, lower power consumption, lowpollution, high reliability, as well as the capability for massproduction. Thus, LEDs are constantly used in a variety of fields, suchas luminaire, traffic signal lamps, mobile phones, scanners, and faxmachines.

During the manufacturing process of the semiconductor light emittingdevices, due to the differences in lattice constant and thermalexpansion coefficient (CTE) between semiconductor layers and ahetero-substrate, dislocations and a thermal stress caused by CTEmismatch in the epitaxy process are commonly found on the semiconductorlayers. Therefore, the conventional semiconductor light emitting devicemay be severely bent due to the stress and the chance of generatingcracks is thus increased.

SUMMARY OF THE INVENTION

The invention provides an epitaxy base and a semiconductor lightemitting device having a preferable epitaxy quality.

The invention also provides manufacturing methods of an epitaxy base anda semiconductor light emitting device for manufacturing the epitaxy baseand the semiconductor light emitting device.

An epitaxy base according to the invention includes a substrate and anucleating layer. The nucleating layer is disposed on the substrate,wherein the nucleating layer is an aluminum nitride layer having asingle crystal structure, a diffraction pattern of the nucleating layerincludes a plurality of dot patterns, each of the dot patterns issubstantially circular, and a ratio between lengths of any two diametersperpendicular to each other on each of the dot patterns ranges fromapproximately 0.9 to approximately 1.1.

According to an embodiment of the invention, a surface of the substrateclose to the nucleating layer is a plane.

According to an embodiment of the invention, the nucleating layer isformed on the substrate by sputtering.

A semiconductor light emitting device according to the inventionincludes an epitaxy base, a first type semiconductor layer, an activelayer, and a second type semiconductor layer. The epitaxy base includesa substrate and a nucleating layer. The nucleating layer is disposed onthe substrate, wherein the nucleating layer is an aluminum nitride layerhaving a single crystal structure, a diffraction pattern of thenucleating layer includes a plurality of dot patterns, each of the dotpatterns is substantially circular, and a ratio between lengths of anytwo diameters perpendicular to each other on each of the dot patternsranges from approximately 0.9 to approximately 1.1. The first typesemiconductor layer is disposed on the nucleating layer. The activelayer is disposed on the first type semiconductor layer. The second typesemiconductor layer is disposed on the active layer.

According to an embodiment of the invention, the semiconductor lightemitting device further includes a buffer layer disposed between thenucleating layer and the first type semiconductor layer.

According to an embodiment of the invention, a surface of the substrateclose to the nucleating layer is a plane.

According to an embodiment of the invention, the nucleating layer isformed on the substrate by sputtering.

A manufacturing method of an epitaxy base according to the inventionincludes: providing a substrate; and forming a nucleating layer in aform of a single crystal structure on the substrate by sputtering,wherein the nucleating layer is an aluminum nitride layer, a diffractionpattern of the nucleating layer includes a plurality of dot patterns,each of the dot patterns is substantially circular, and a ratio betweenlengths of any two diameters perpendicular to each other on each of thedot patterns ranges from approximately 0.9 to approximately 1.1.

According to an embodiment of the invention, a surface of the substrateclose to the nucleating layer is a plane.

A manufacturing method of a semiconductor light emitting deviceaccording to the invention includes: providing a substrate; forming anucleating layer in a form of a single crystal structure on thesubstrate by sputtering, wherein the nucleating layer is an aluminumnitride layer, a diffraction pattern of the nucleating layer includes aplurality of dot patterns, each of the dot patterns is substantiallycircular, and a ratio between lengths of any two diameters perpendicularto each other on each of the dot patterns ranges from approximately 0.9to approximately 1.1; forming a first type semiconductor layer byperforming a metal organic chemical vapor deposition process, whereinthe first type semiconductor layer is disposed on the nucleating layer;forming an active layer by performing the metal organic chemical vapordeposition process, wherein the active layer is disposed on the firsttype semiconductor layer; and forming a second type semiconductor layerby performing the metal organic chemical vapor deposition process,wherein the second type semiconductor layer is disposed on the activelayer.

According to an embodiment of the invention, a buffer layer is furtherformed by performing the metal organic chemical vapor depositionprocess, wherein the buffer layer is disposed between the nucleatinglayer and the first type semiconductor layer.

According to an embodiment of the invention, a surface of the substrateclose to the nucleating layer is a plane.

Based on the above, in the manufacturing method of the epitaxy base andthe semiconductor light emitting device of the invention, the nucleatinglayer is formed on the substrate by sputtering, so as to manufacture theepitaxy base. Since the nucleating layer is the aluminum nitride layerhaving the single crystal structure and the lattice thereof iswell-organized, the semiconductor layers grown subsequently may have apreferable epitaxy quality, and the semiconductor light emitting devicewith a better working efficiency may thus be manufactured.

To make the above features and advantages of the invention morecomprehensible, embodiments accompanied with drawings are described indetail as follows.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of the invention, and are incorporated in and constitute apart of this specification. The drawings illustrate embodiments of theinvention and, together with the description, serve to explain theprinciples of the invention.

FIG. 1 is a schematic view illustrating an epitaxy base according to anembodiment of the invention.

FIG. 2A illustrates an electron diffraction pattern of a nucleatinglayer of the epitaxy base of FIG. 1.

FIG. 2B is an enlarged partial view of FIG. 2A.

FIG. 2C illustrates a diffraction pattern of a conventional nucleatinglayer.

FIG. 2D is an enlarged partial view of FIG. 2C.

FIG. 3 is a schematic view illustrating a semiconductor light emittingdevice according to an embodiment of the invention.

FIG. 4 is a schematic flowchart illustrating a manufacturing method of asemiconductor light emitting device according to an embodiment of theinvention.

DESCRIPTION OF THE EMBODIMENTS

Reference will now be made in detail to the present preferredembodiments of the invention, examples of which are illustrated in theaccompanying drawings. Wherever possible, the same reference numbers areused in the drawings and the description to refer to the same or likeparts.

FIG. 1 is a schematic view illustrating an epitaxy base according to anembodiment of the invention. Referring to FIG. 1, an epitaxy base 100 ofthis embodiment includes a substrate 110 and a nucleating layer 120.

In this embodiment, the substrate 110 is a sapphire substrate. However,in other embodiments, any substrate material capable of growing a GroupIII-V (e.g. a Group III nitride) semiconductor layer, such as Si, SiO₂,GaN, AlN, spinnel, SiC, GaAs, LiGaO₂, LiAlO₂, or MgAl₂O₄, for example,may be used.

As shown in FIG. 1, in this embodiment, the nucleating layer 120 isdirectly disposed on a surface of the substrate 110, and the surfacewhere the substrate 110 contacts the nucleating layer 120 is a plane.However, in other embodiments, the substrate 110 may have a patternedsurface, and a form of the substrate 110 is not limited thereto.

The nucleating layer 120 is disposed on the substrate 110, and a purposeof the nucleating layer 120 is to improve a film-forming uniformity ofsemiconductor layers when the semiconductor layers (e.g. a first typesemiconductor layer 240, an active layer 250, and a second typesemiconductor layer 260, as shown in FIG. 3) are subsequently grown, soas to improve a working efficiency of a semiconductor structure formedby the semiconductor layers.

In this embodiment, a material of the nucleating layer 120 is aluminumnitride, and the nucleating layer 120 is formed on the substrate 110 byperforming a sputtering process. In general, the sputtering process isperformed in a space filled with an inert gas (usually argon), and argonis ionized to generate an argon electron flow with a high energy due toan effect of a high potential electrical field. Then, the argon electronflow bombards a target cathode, so as to hit atoms or molecules in thesolid target out of the target to be deposited on the substrate 110. Dueto a characteristic of sputtering, during the sputtering process,aluminum nitride molecules receive a stronger driving force in a coatingdirection. Therefore, the nucleating layer 120 is able to be formed in asingle crystal structure with a preferable lattice arrangement on thesubstrate 110. Of course, in other embodiment, the method of forming thenucleating layer 120 is not limited to sputtering, as long as thenucleating layer 120 is formed as a well-organized single crystalstructure.

It should be noted that a general description about the appearance of alattice is referred to as direct lattice, while a space where the directlattice is located is referred to as real space. When it is intended toobserve whether the lattice arrangement of the nucleating layer is asingle crystal structure, it is very difficult to make a decision anddefine according to the real space. Currently, a crystalline structuremay be detected by using wave diffraction. And a result thus obtainedmay indicate whether a lattice arrangement is in a single crystalstructure by representing the result in a reciprocal space.

More specifically, a lattice (i.e. reciprocal lattice) represented inthe reciprocal space is formed of a normal vector of each crystal planein the direct lattice, each point in the reciprocal lattice represents aplane, and a connecting line between each point and the origin indicatesa normal vector direction of a crystal plane in an original reallattice, a connecting line to a point represents a normal vectordirection of a crystal plane in an original real lattice, and a distancethereof represents a reciprocal of a spacing of the crystal plane. Anelectromagnetic wave (e.g. X-ray) generates diffraction when passing acrystal body, and the diffraction point is a reciprocal lattice point,i.e. a position where the electromagnetic wave generates a fullyconstructive interference. By using a fluorescent screen or a detector,positions of such points or signals may be detected, the diffractionpoints are related to the lattice structure, and the relation is arelation between reciprocal lattice and real lattice. Thus, based on thediffraction points or signals, the crystal structure of a material maybe known. For example, if the single crystal structure is irradiated byan X-ray with continuous wavelength, any plane meeting the Bragg's Lawmay generate a strong diffraction. Thus, a crystalline compound may showa specific diffraction pattern. In addition, based on a pattern ofdistribution of the diffraction points, the symmetry of the lattice maybe determined.

In the following, a diffraction pattern of the nucleating layer 120 ofthe epitaxy base 100 of this embodiment and a diffraction pattern of aconventional nucleating layer are compared. Based on the diffractionpatterns thereof, a difference between the nucleating layer of thisembodiment and the conventional nucleating layer is clearly shown.

FIG. 2A illustrates the diffraction pattern of the nucleating layer ofthe epitaxy base of FIG. 1. FIG. 2B is an enlarged schematic partialview of FIG. 2A. Referring to FIGS. 2A and 2B, in this embodiment, thediffraction pattern of the nucleating layer 120 includes a plurality ofdot patterns 122. Each of the dot patterns 122 is substantiallycircular, and a ratio between lengths of any two diameters D1 and D2perpendicular to each other on each of the dot patterns 122 ranges fromapproximately 0.9 to approximately 1.1. In a preferred embodiment, theratio of the lengths of the arbitrary diameters D1 and D2 perpendicularto each other on each of the dot patterns 122 is substantially 1.Judging from shapes of the circular dot patterns 122 shown in FIGS. 2Aand 2B, it can be known that the nucleating layer 120 of the epitaxybase 100 of this embodiment is a well-organized single crystalstructure.

FIG. 2C illustrates the diffraction pattern of the conventionalnucleating layer. FIG. 2D is an enlarged schematic partial view of FIG.2C. Referring to FIGS. 2C and 2D, the diffusion pattern of theconventional nucleating pattern also includes a plurality of dotpatterns 122′. However, a profile of each of the dot patterns 122′ isdistorted and in a non-circular shape. In FIG. 2D, a ratio betweenlengths of any two line segments L1 and L2 perpendicular to each otherand passing a center of each of the dot patterns 122′ is greater than1.1. As shown in FIG. 2C, it can be known that there is a continuouschange in a lattice arrangement of the conventional nucleating layeralong a C direction (close to a horizontal direction in the figure).Thus, it is determined that the nucleating layer is not a well-organizedsingle crystal structure.

Since the epitaxy base 100 of this embodiment has the nucleating layer120 having a single crystal structure with a generally well-arrangedlattice, when the semiconductor layers are subsequently formed on thenucleating layer 120, the epitaxy quality may be more preferable. In thefollowing, a semiconductor light emitting device 200 having the epitaxybase 100 is described.

FIG. 3 is a schematic view illustrating a semiconductor light emittingdevice according to an embodiment of the invention. Referring to FIG. 3,the semiconductor light emitting device 200 of this embodiment includesthe epitaxy base 100 of FIG. 1, a buffer layer 230, a first typesemiconductor layer 240, an active layer 250, and a second typesemiconductor layer 260. The buffer layer 230 is disposed on thenucleating layer 120. The first type semiconductor layer 240 is disposedon the buffer layer 230. The active layer 250 is disposed on the firsttype semiconductor layer 240. The second type semiconductor layer 260 isdisposed on the active layer 250. It should be noted that thicknesses ofthe layers shown in FIG. 3 are only for an illustrative purpose, and thethicknesses of the layers in the actual practice are not limitedthereto.

In this embodiment, the buffer layer 230 includes a Group III-V compoundsemiconductor which is undoped gallium nitride, for example. Given thatthe semiconductor layers are subsequently grown on the epitaxy base 100,there may be lattice mismatch as well as mismatch in thermal expansioncoefficient since there are significant differences in lattice constantand thermal expansion coefficient between the semiconductor layers andthe substrate 110. In this embodiment, the buffer layer 230 is disposedon the nucleating layer 120 to reduce the lattice mismatch between thesemiconductor layers and the substrate 110, so as to offer a morepreferable epitaxy quality to the subsequent semiconductor layers, suchthat the semiconductor light emitting device 200 has a preferableworking efficiency. Of course, in other embodiments, the buffer layer230 may be omitted from the semiconductor light emitting device 200. Inthis way, the first type semiconductor layer 240 is directly disposed onthe nucleating layer 120.

The first type semiconductor layer 240 is, for example, an n-typenitride semiconductor layer, the second type semiconductor layer 260 is,for example, a p-type nitride semiconductor layer, and the active layer250 is, for example, a multi-quantum well structure. The first typesemiconductor layer 240 and the second type semiconductor layer 260 are,for example, GaN, AlGaN, or InGaN. An n-type dopant doped in the firsttype semiconductor layer 240 may include at least one Group IVA element,and a p-type dopant doped in the second type semiconductor layer 260 mayinclude at least one Group IIA element. In this embodiment, the n-typedopant may be silicon, and the p-type dopant may be magnesium. However,the types of the n-type and p-type dopants are not limited thereto.

In the semiconductor light emitting device 200 of this embodiment, sincethe nucleating layer 120 of the epitaxy base 100 has the single crystalstructure with the well-organized lattice, the epitaxy quality of thebuffer layer 230, the first type semiconductor layer 240, the activelayer 250, and the second type semiconductor layer 260 that aresubsequently disposed on the nucleating layer 120 is improved. Thus, thesemiconductor light emitting device 200 has a preferable workingefficiency.

FIG. 4 is a schematic flowchart illustrating a manufacturing method of asemiconductor light emitting device according to an embodiment of theinvention. Referring to FIG. 4, in this embodiment, a manufacturingmethod 300 of a semiconductor light emitting device includes a method ofmanufacturing an epitaxy base. The method of manufacturing the epitaxybase includes steps as follows. First of all, a substrate is provided(Step 310). In this embodiment, the epitaxy substrate is a sapphiresubstrate. However, in other embodiments, any substrate material capableof growing a Group III-V (e.g. a Group III nitride) semiconductor layermay be used.

Then, a nucleating layer is formed on the substrate in a form of asingle crystal structure by performing a sputtering process. Inaddition, the nucleating layer is a aluminum nitride layer, adiffraction pattern of the nucleating layer includes a plurality of dotpatterns, each of the dot patterns is substantially circular, and aratio between lengths of any two diameters perpendicular to each otheron each of the dot patterns ranges from approximately 0.9 toapproximately 1.1 (Step 320). By performing the steps above, the epitaxybase having a preferable epitaxy quality is manufactured.

After the epitaxy base is manufactured, the following steps areperformed. A buffer layer is formed by performing a metal organicchemical vapor deposition process (Step 330). In this embodiment, thebuffer layer includes a Group III-V compound semiconductor which isundoped gallium nitride, for example. In addition, in other embodiments,Step 330 may be skipped, and Step 340 may be directly performed.

Then, the first-type semiconductor layer is formed by performing themetal organic chemical vapor deposition process, and the first typesemiconductor layer is disposed on the nucleating layer, and the bufferlayer is disposed between the nucleating layer and the first typesemiconductor layer (Step 340). In this embodiment, the first typesemiconductor layer is, for example, GaN, AlGaN, or InGaN.

Then, an active layer is formed by performing the metal organic chemicalvapor deposition process, and the active layer is disposed on the firsttype semiconductor layer (Step 350). The active layer is a multi-quantumwell structure, for example.

Lastly, a second type semiconductor layer is formed by performing themetal organic chemical vapor deposition process, and the second typesemiconductor layer is disposed on the active layer (Step 360). In thisembodiment, the second type semiconductor layer is, for example, GaN,AlGaN, or InGaN.

In the manufacturing method 300 of the semiconductor light emittingdevice of this embodiment, the nucleating layer is formed on thesubstrate by sputtering, such that the nucleating layer is formed as thesingle crystal structure having the well-organized lattice. Then, thebuffer layer, the first type semiconductor layer, the active layer, andthe second semiconductor layer subsequently formed on the nucleatinglayer may have a preferable epitaxy quality, thus making thesemiconductor light emitting device have a preferable workingefficiency.

In view of the foregoing, in the manufacturing method of the epitaxybase and the semiconductor light emitting device of the invention, thenucleating layer is formed on the substrate by sputtering, so as tomanufacture the epitaxy base. Since the nucleating layer is the aluminumnitride layer having the single crystal structure and the latticethereof is well-organized, the semiconductor layers grown subsequentlymay have a preferable epitaxy quality, and the semiconductor lightemitting device with a better working efficiency may thus bemanufactured.

Although the present invention has been described with reference to theabove embodiments, it is apparent to one of the ordinary skill in theart that modifications to the described embodiments may be made withoutdeparting from the spirit of the invention. Accordingly, the scope ofthe invention will be defined by the attached claims not by the abovedetailed descriptions.

What is claimed is:
 1. An epitaxy base, comprising: a substrate; and anucleating layer, disposed on the substrate, wherein the nucleatinglayer is an aluminum nitride layer having a single crystal structure andthe lattice thereof is well-organized, an electron diffraction patternof the nucleating layer comprises a plurality of dot patterns, each ofthe dot patterns is substantially circular, and a ratio between lengthsof any two diameters perpendicular to each other on each of the dotpatterns ranges from approximately 0.9 to approximately 1.1.
 2. Theepitaxy base as claimed in claim 1, wherein a surface of the substrateclose to the nucleating layer is a plane.
 3. The epitaxy base as claimedin claim 1, wherein the nucleating layer is formed on the substrate bysputtering.
 4. The epitaxy base as claimed in claim 1, furthercomprising a buffer layer disposed on the nucleating layer.
 5. Amanufacturing method of an epitaxy base, comprising: providing asubstrate; and forming a nucleating layer in a form of a single crystalstructure on the substrate by sputtering, wherein the nucleating layeris an aluminum nitride layer and the lattice thereof is well-organized,an electron diffraction pattern of the nucleating layer comprises aplurality of dot patterns, each of the dot patterns is substantiallycircular, and a ratio between lengths of any two diameters perpendicularto each other on each of the dot patterns ranges from approximately 0.9to approximately 1.1.
 6. An epitaxy base, comprising: a substrate; anucleating layer, disposed on the substrate, wherein the nucleatinglayer is an aluminum nitride layer having a single crystal structure, anelectron diffraction pattern of the nucleating layer comprises aplurality of dot patterns, each of the dot patterns is substantiallycircular, and a ratio between lengths of any two diameters perpendicularto each other on each of the dot patterns ranges from approximately 0.9to approximately 1.1; and a buffer layer, disposed on the nucleatinglayer.
 7. The epitaxy base as claimed in claim 6, wherein a surface ofthe substrate close to the nucleating layer is a plane.
 8. The epitaxybase as claimed in claim 6, wherein the nucleating layer is formed onthe substrate by sputtering.